Correlating the properties of amorphous silicon with its flexibility volume
Author:
Funder
U.S. Department of Energy
Basic Energy Sciences
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.95.144211/fulltext
Reference52 articles.
1. Amorphous silicon produced by a new thermal chemical vapor deposition method using intermediate species SiF2
2. Catalytic Chemical Vapor Deposition (CTC-CVD) Method Producing High Quality Hydrogenated Amorphous Silicon
3. A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous silicon
4. Grain boundary mediated amorphization in silicon during ion irradiation
5. Structural relaxation and defect annihilation in pure amorphous silicon
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