Chemical-equilibrium model of optimala-Si:H growth fromSiH4
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.41.7952/fulltext
Reference11 articles.
1. Chemical-equilibrium description of the gap-state distribution ina-Si:H
2. Defect equilibria in undopeda-Si:H
3. Hydrogen incorporation in silicon thin films deposited with a remote hydrogen plasma
4. Radical species in argon‐silane discharges
5. Neutral radical deposition from silane discharges
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