Threshold voltage tuning of IGZTO thin-film transistors deposited by RF sputtering for high-resolution flexible displays using deep ultraviolet light-Reference-Cited by-同舟云学术

Threshold voltage tuning of IGZTO thin-film transistors deposited by RF sputtering for high-resolution flexible displays using deep ultraviolet light

Published:2023 Issue:23 Volume:11 Page:7793-7801
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Park In Pyo¹²,Hwang Bu Kyeong¹³,Lee Bo Ram¹³,Song Pung Keun²,Heo Soo Won¹^ORCID

Affiliation:

1. Nano Convergence Materials Center, Emerging Materials R&D Division, Korea Institute of Ceramic Engineering and Technology (KICET), 101 Soho-ro, Jinju-si 52851, Gyeongsangnam-do, Korea

2. Department of Materials Science and Engineering, Pusan National University, Busan 46241, Korea

3. Department of Electrical and Electronics Engineering, Pusan National University, Busan 46241, Korea

Abstract

Development of DUV/Thermal dual treatment (DTT) process to improve the electrical performance and stability of oxide thin film transistors while efficiently controlling the threshold voltage of the device.

Funder

National Research Foundation of Korea

Korea Evaluation Institute of Industrial Technology

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2023/TC/D3TC01379K

Reference23 articles.

1. Flexible high-resolution full-color top-emitting active-matrix organic light-emitting diode display

2. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

3. High mobility indium free amorphous oxide thin film transistors

4. 53.1: Development of Oxide-TFT OLED-TV Technologies

5. Effects of Microwave Annealing on Nitrogenated Amorphous In-Ga-Zn-O Thin-Film Transistor for Low Thermal Budget Process Application