Hyperbranched polysiloxane (HBPSi)-based polyimide films with ultralow dielectric permittivity, desirable mechanical and thermal properties
Author:
Affiliation:
1. Department of Applied Chemistry
2. Key Laboratory of Space Applied Physics and Chemistry of Ministry of Education
3. School of Science
4. Northwestern Polytechnical University
5. Xi'an 710072
Abstract
A 35 wt% HBPSi polyimide film exhibits an ultralow dielectric permittivity (2.24), accompanied by the most desirable comprehensive properties.
Funder
National Natural Science Foundation of China
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2016/TC/C5TC03391H
Reference74 articles.
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5. Ultra low dielectric constant soluble polyhedral oligomeric silsesquioxane (POSS)–poly(aryl ether ketone) nanocomposites with excellent thermal and mechanical properties
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