Relationships between the solution and solid-state properties of solution-cast low-k silica thin films-Reference-Cited by-同舟云学术

Relationships between the solution and solid-state properties of solution-cast low-k silica thin films

Published:2016 Issue:30 Volume:18 Page:20371-20380
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Chiang Chao-Ching¹²³⁴,Su Chien-You¹⁵⁶⁴,Yang An-Chih¹²³⁴,Wang Ting-Yu⁷²³⁴,Lee Wen-Ya⁸⁹¹⁰⁴^ORCID,Hua Chi-Chung¹⁵⁶⁴,Kang Dun-Yen¹²³⁴

Affiliation:

1. Department of Chemical Engineering

2. National Taiwan University

3. Taipei 10617

4. Republic of China

5. National Chung Cheng University

6. Chia-Yi 62102

7. Electron Microscope Unit of Instrument Center

8. Department of Chemical Engineering and Biotechnology

9. National Taipei University of Technology

10. Taipei 10608

Abstract

This paper reports on the fabrication of low-k (amorphous) silica thin films cast from solutions without and with two different types of surfactants (TWEEN® 80 and Triton™ X-100) to elucidate the relationships between the structural/morphological features of the casting solutions and the physical properties of the resulting thin films.

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2016/CP/C6CP04166C

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