Mechanism of the thermal decomposition of tetramethylsilane: a flash pyrolysis vacuum ultraviolet photoionization time-of-flight mass spectrometry and density functional theory study-Reference-Cited by-同舟云学术

Mechanism of the thermal decomposition of tetramethylsilane: a flash pyrolysis vacuum ultraviolet photoionization time-of-flight mass spectrometry and density functional theory study

Published:2018 Issue:27 Volume:20 Page:18782-18789
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Liu Xinghua¹²³⁴^ORCID,Zhang Jingsong⁵⁶⁷⁸⁶^ORCID,Vazquez Alexis⁹⁶⁷,Wang Daxi¹²³⁴,Li Shuyuan¹²³⁴¹⁰

Affiliation:

1. College of Science

2. China University of Petroleum (Beijing)

3. Changping

4. China

5. Department of Chemistry, University of California

6. Riverside

7. USA

8. Air Pollution Research Center, University of California

9. Riverside City College

10. State Key Laboratory of Heavy Oil Processing, China University of Petroleum (Beijing)

Abstract

Silene/silyene conversion via 1,2-shift plays an important role in H₂ elimination in the process of the thermal decomposition of tetramethylsilane.

Funder

National Science Foundation

China Scholarship Council

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2018/CP/C8CP02626B

Reference58 articles.

1. A morphological and structural study of SiC layers obtained by LPCVD using tetramethylsilane

2. Influence of temperature and tetramethylsilane partial pressure on the β-SiC deposition by cold wall chemical vapor deposition

3. Growth and properties of CVD-SiC layers using tetramethylsilane

4. Investigation of the chemical vapor deposition of silicon carbide from tetramethylsilane by in situ temperature and gas composition measurements

5. A thermodynamical approach to tetramethylsilane (TMS) pyrolysis; application to SiC coatings obtained by MOCVD

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