Synthesis, characterization and electrical properties of silicon-doped graphene films

Author:

Wang Zegao12345,Li Pingjian1234,Chen Yuanfu1234,Liu Jingbo1234,Zhang Wanli1234,Guo Zheng6789,Dong Mingdong5789,Li Yanrong1234

Affiliation:

1. State Key Laboratory of Electronic Thin Films and Integrated Devices

2. University of Electronic Science and Technology of China

3. Chengdu 610054

4. P. R. China

5. Interdisciplinary Nanoscience Center (iNANO)

6. Department of Engineering

7. Aarhus University

8. DK-8000 Aarhus C

9. Denmark

Abstract

A silicon-doped graphene film was synthesized by CVD using triphenylsilane as a sole carbon and silicon source. The silicon-doped graphene exhibits a strong p-type feature and has a large hole mobility of 660 cm2 V−1 s−1.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

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