Unraveling the complex chemistry using dimethylsilane as a precursor gas in hot wire chemical vapor deposition-Reference-Cited by-同舟云学术

Unraveling the complex chemistry using dimethylsilane as a precursor gas in hot wire chemical vapor deposition

Published:2014 Issue:17 Volume:16 Page:7896-7906
ISSN:1463-9076
Container-title:Phys. Chem. Chem. Phys.
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Toukabri Rim¹²³,Shi Yujun¹²³

Affiliation:

1. Department of Chemistry

2. University of Calgary

3. Calgary, T2N 1N4 Canada

Abstract

At low filament temperatures and short reaction time, silylene chemistry dominates. The free-radical reactions become more important with increasing temperature and time.

Funder

Natural Sciences and Engineering Research Council of Canada

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2014/CP/C4CP00275J

Reference42 articles.

1. Pyrolysis of monomethyl- and dimethylsilane. The role of molecular and radical processes

2. Kinetics of the high-temperature thermal decomposition of silanes and alkylsilanes

3. Kinetic and product studies of the thermal decomposition of dimethylsilane in a single-pulse shock tube and in a stirred flow reactor

4. Mechanism of the thermal decomposition of dimethylsilane at atmospheric pressures in the gas phase

5. Photochemistry of silicon compounds. 5. The 147-nm photolysis of dimethylsilane

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