Optical emission spectroscopy diagnostic and thermodynamic analysis of thermal plasma enhanced nanocrystalline silicon CVD process-Reference-Cited by-同舟云学术

Optical emission spectroscopy diagnostic and thermodynamic analysis of thermal plasma enhanced nanocrystalline silicon CVD process

Published:2014 Issue:29 Volume:4 Page:15131-15137
ISSN:2046-2069
Container-title:RSC Adv.
language:en
Short-container-title:RSC Adv.

Author:

Cao Tengfei¹²³,Zhang Haibao¹²³,Yan Binhang¹²³,Lu Wei¹²³,Cheng Yi¹²³

Affiliation:

1. Department of Chemical Engineering

2. Tsinghua University

3. Beijing, China

Abstract

Optical emission spectroscopy and thermal equilibrium analysis were implemented to study the plasma enhanced chemical vapor deposition of nanocrystalline silicon.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2014/RA/C4RA01306A

Reference37 articles.

1. Rapid, low-temperature synthesis of nc-Si in high-density, non-equilibrium plasmas: enabling nanocrystallinity at very low hydrogen dilution

2. Complete microcrystallinep‐i‐nsolar cell—Crystalline or amorphous cell behavior?

3. High-mobility nanocrystalline silicon thin-film transistors fabricated by plasma-enhanced chemical vapor deposition

4. Directly deposited nanocrystalline silicon thin-film transistors with ultra high mobilities

5. Material and solar cell research in microcrystalline silicon

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