Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications
Author:
Affiliation:
1. Advanced Research Center for Nanolithography
2. 1098 XG Amsterdam
3. The Netherlands
4. SOLEIL
5. 91192 Gif sur Yvette Cedex
6. France
Abstract
Aromatic structures in organic shell stabilize photoionization products of metal oxo clusters, a new type of materials for EUV lithography.
Funder
Horizon 2020 Framework Programme
Agence Nationale de la Recherche
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2019/TC/C8TC05273E
Reference30 articles.
1. The Physics of EUV Photoresist and How It Drives Strategies for Improvement
2. Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning
3. Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning
4. Extreme ultraviolet resist materials for sub-7 nm patterning
5. The importance of inner-shell electronic structure for enhancing the EUV absorption of photoresist materials
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