Controlled solvent vapor annealing of a high χ block copolymer thin film-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Controlled solvent vapor annealing of a high χ block copolymer thin film

Published:2017 Issue:4 Volume:19 Page:2805-2815
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Lundy Ross¹²³⁴⁵^ORCID,Flynn Shauna P.⁶⁷⁸⁵,Cummins Cian⁹¹⁰¹¹⁵,Kelleher Susan M.⁶⁷⁸⁵,Collins Maurice N.¹²¹³¹⁴⁵,Dalton Eric¹²¹³¹⁴⁵,Daniels Stephen⁶⁷⁸⁵,Morris Michael A.⁹¹⁰¹¹⁵,Enright Ryan¹²³⁴⁵

Affiliation:

1. Thermal Management Research Group

2. Efficient Energy Transfer (ηET) Dept.

3. Bell Labs Ireland

4. Dublin 15

5. Ireland

6. National Centre for Plasma Science and Technology

7. Dublin City University

8. Dublin 9

9. AMBER@CRANN

10. Trinity College Dublin

11. Dublin

12. Stokes Laboratories

13. University of Limerick, Co.

14. Limerick

Abstract

Wafer scale high χ block copolymer patterning via dynamic solvent vapor annealing.

Funder

Irish Research Council for Science, Engineering and Technology

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2017/CP/C6CP07633E

Reference68 articles.

1. ITRS, Lithography Summary, Int. Technol. Roadmap Semicond., 2014

2. Directed self-assembly of block copolymers for nanocircuitry fabrication

3. Self-assembly of polystyrene-block-poly(4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: fabrication of inorganic nanostructured etchmask for lithographic use

4. Monolayer films of diblock copolymer microdomains for nanolithographic applications

5. Large Area High Density Sub-20 nm SiO2 Nanostructures Fabricated by Block Copolymer Template for Nanoimprint Lithography

Cited by 49 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Disclosing Topographical and Chemical Patterns in Confined Films of High-Molecular-Weight Block Copolymers under Controlled Solvothermal Annealing;Polymers;2024-07-08

2. Insights into the feature size required for the death of Pseudomonas fluorescens on nanostructured silicon fabricated by block copolymer lithography;Materials Today Communications;2024-03

3. Disclosing Topographical and Chemical Patterns in Confined Films of High Molecular Weight Block Copolymers Under Controlled Solvothermal Annealing;2024

4. Perpendicular Domain Orientation of Poly(styrene-block-methylmethacrylate (PS-b-PMMA) Thin Films Produced on Zinc Oxide Nanoparticle Layer;Polymer Science, Series A;2023-12

5. Morphology Engineering of the Asymmetric PS-b-P4VP Block Copolymer: From Porous to Nanodot Oxide Structures;ACS Applied Polymer Materials;2023-11-02

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3