A study on inorganic phase-change resist Ge2Sb2(1−x)Bi2xTe5and its mechanism-Reference-Cited by-同舟云学术

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A study on inorganic phase-change resist Ge2Sb2(1−x)Bi2xTe5and its mechanism

Published:2014-09-09 Issue:40 Volume:16 Page:22281-22286
ISSN:1463-9076
Container-title:Phys. Chem. Chem. Phys.
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Li Jianzheng,Zheng Lirong,Xi Hongzhu,Liu Dingxin,Zhang Hongguang,Tian Ye,Xie Yong,Zhu Xing,Liu Qian

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2014/CP/C4CP03315A

Reference34 articles.

1. Subtractive Patterning via Chemical Lift-Off Lithography

2. Preparation of tools for lithographically controlled wetting and soft lithography

3. Imprint of sub‐25 nm vias and trenches in polymers

4. Lithography gets extreme

5. Pushing the limits of lithography

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1. 基于相变薄膜高分辨激光直写光刻研究进展（特邀）;Chinese Journal of Lasers;2024

2. Direct Laser Writing Dry Lithography of High‐Resolution Micro‐/Nanostructures in AgSb₄Te Thin Film for Tunable Perfect Absorber;physica status solidi (RRL) – Rapid Research Letters;2023-12-24

3. Mechanism of Corrosion Selectivity of NSb₂Te Thin Films in the H₃PO₄/HNO₃ Developer for Direct Laser Writing Nanolithography;ACS Applied Nano Materials;2023-07-04

4. Corrosion selectivity and structural evolution in N doped Sb2Te thin films for lithography application;Journal of Alloys and Compounds;2022-11

5. 基于Ge2Sb1.5Bi0.5Te5可饱和吸收体的锁模光纤激光器;ACTA PHOTONICA SINICA;2022

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