Self limiting atomic layer deposition of Al2O3 on perovskite surfaces: a reality?-Reference-Cited by-同舟云学术

Self limiting atomic layer deposition of Al2O3 on perovskite surfaces: a reality?

Published:2016 Issue:14 Volume:8 Page:7459-7465
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Choudhury Devika¹²³,Rajaraman Gopalan⁴²³,Sarkar Shaibal K.¹²³

Affiliation:

1. Department of Energy Science and Engineering

2. Indian Institute of Technology Bombay

3. Mumbai-400076, India

4. Department of Chemistry

Abstract

The feasibility of self-saturated atomic layer deposition of Al₂O₃ on an organolead halide perovskite (MAPbI_3−xCl_x) surface through a well known trimethylaluminium (TMA)–water (H₂O) chemistry is studied.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2016/NR/C5NR06974B

Reference28 articles.

1. Organometal Halide Perovskites as Visible-Light Sensitizers for Photovoltaic Cells

2. The emergence of perovskite solar cells

3. Low-temperature processed meso-superstructured to thin-film perovskite solar cells

4. Perovskite solar cells with a planar heterojunction structure prepared using room-temperature solution processing techniques

5. Sequential deposition as a route to high-performance perovskite-sensitized solar cells

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