Atomic/molecular layer deposition of cerium(<scp>iii</scp>) hybrid thin films using rigid organic precursors-Reference-Cited by-同舟云学术

Atomic/molecular layer deposition of cerium(iii) hybrid thin films using rigid organic precursors

Published:2022 Issue:14 Volume:51 Page:5603-5611
ISSN:1477-9226
Container-title:Dalton Transactions
language:en
Short-container-title:Dalton Trans.

Author:

Kaur Parmish¹^ORCID,Muriqi Arbresha²^ORCID,Wree Jan-Lucas¹^ORCID,Ghiyasi Ramin³,Safdar Muhammad³,Nolan Michael²^ORCID,Karppinen Maarit³^ORCID,Devi Anjana¹^ORCID

Affiliation:

1. Inorganic Materials Chemistry, Ruhr University Bochum, Universitätsstraße 150, 44801 Bochum, Germany

2. Tyndall National Institute, University College Cork, Lee Maltings, Cork T12 R5CP, Ireland

3. Department of Chemistry and Materials Science, Aalto University, Kemistintie 1, 00076 Aalto, Espoo, Finland

Abstract

New ALD/MLD processes for Ce-based hybrid thin films using compatible inorganic and organic precursors with findings supported by DFT studies.

Funder

Horizon 2020

Deutsche Forschungsgemeinschaft

Science Foundation Ireland

Publisher

Royal Society of Chemistry (RSC)

Subject

Inorganic Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2022/DT/D2DT00353H

Reference44 articles.

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