Conductance tomography of conductive filaments in intrinsic silicon-rich silica RRAM
Author:
Affiliation:
1. Department of Electronic and Electrical Engineering
2. University College London
3. London WC1E 7JE, UK
Abstract
Conductive atomic force microscopy was used to etch through SiOxresistance switching devices to produce three-dimensional renderings of conductive filaments.
Funder
Engineering and Physical Sciences Research Council
Publisher
Royal Society of Chemistry (RSC)
Subject
General Materials Science
Link
http://pubs.rsc.org/en/content/articlepdf/2015/NR/C5NR04982B
Reference28 articles.
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