Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments-Reference-Cited by-同舟云学术

Stability studies of ZnO and AlN thin film acoustic wave devices in acid and alkali harsh environments

Published:2020 Issue:33 Volume:10 Page:19178-19184
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Xiong Shuo¹²³⁴⁵,Liu Xudong¹²³⁴⁵,Zhou Jian¹²³⁴⁵^ORCID,Liu Yi⁶⁷⁸⁵,Shen Yiping⁶⁷⁸⁵,Yin Xiaobo¹²³⁴⁵,Wu Jianhui¹²³⁴⁵,Tao Ran⁹¹⁰¹¹¹²^ORCID,Fu Yongqing⁹¹⁰¹¹¹²^ORCID,Duan Huigao¹²³⁴⁵

Affiliation:

1. State Key Laboratory of Advanced Design and Manufacturing for Vehicle Body

2. College of Mechanical and Vehicle Engineering

3. Hunan University

4. Changsha 410082

5. China

6. Hunan Provincial Key Laboratory of Health Maintenance for Mechanical Equipment

7. Hunan University of Science and Technology

8. Xiangtan 411201

9. Faculty of Engineering and Environment

10. Northumbria University

11. Newcastle upon Tyne

12. UK

Abstract

Surface acoustic wave (SAW) devices based on piezoelectric thin-films such as ZnO and AlN are widely used in sensing, microfluidics and lab-on-a-chip applications.

Funder

Engineering and Physical Sciences Research Council

Royal Society

National Natural Science Foundation of China

Ministry of Education of the People's Republic of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2020/RA/D0RA02448A

Reference24 articles.