Photochemistry of trimethyl arsine at 193 nm-Reference-Cited by-同舟云学术

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Photochemistry of trimethyl arsine at 193 nm

Published:1991 Issue:15 Volume:87 Page:2383
ISSN:0956-5000
Container-title:Journal of the Chemical Society, Faraday Transactions
language:en
Short-container-title:Faraday Trans.

Author:

Fahr A.,Braun W.,Klein R.,Dorko W.,Okabe H.

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/1991/FT/FT9918702383

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. ChemInform Abstract: Photochemistry of Trimethyl Arsine at 193 nm.;ChemInform;2010-08-22

2. Laser-induced gas-phase pyrolysis of dimethyl selenium: chemical deposition of selenium and poly(selenoformaldehyde);Journal of Analytical and Applied Pyrolysis;2004-06

3. Megawatt laser photolysis of trimethyl(vinyloxy)silane: formation of nano-sized cross-linked polyoxocarbosilane with superior thermal stability;Journal of Non-Crystalline Solids;2003-10

4. UV Laser Photolysis of Disiloxanes for Chemical Vapor Deposition of Nano-Textured Silicones;Chemistry of Materials;2001-12-04

5. Atmospheric pressure chemical vapour deposition of selenium films by KrF laser photolysis of dimethyl selenium;Applied Surface Science;2001-03

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