Finite temperature behavior of carbon atom-doped silicon clusters: depressed thermal stabilities, coexisting isomers, reversible dynamical pathways and fragmentation channels-Reference-Cited by-同舟云学术

Finite temperature behavior of carbon atom-doped silicon clusters: depressed thermal stabilities, coexisting isomers, reversible dynamical pathways and fragmentation channels

Published:2021 Issue:18 Volume:45 Page:8217-8227
ISSN:1144-0546
Container-title:New Journal of Chemistry
language:en
Short-container-title:New J. Chem.

Author:

Joshi Krati¹²³⁴^ORCID,Maibam Ashakiran⁵⁶⁷⁴^ORCID,Krishnamurty Sailaja⁵⁶⁷⁴^ORCID

Affiliation:

1. Functional Materials Division

2. CSIR-Central Electrochemical Research Institute

3. Karaikudi-630 006

4. India

5. Physical and Materials Division

6. CSIR-National Chemical Laboratory

7. Pune 411 008

Abstract

BOMD simulations revealed a multifarious thermo-stimuli response (from “solid-state” to reversible dynamics to fragmentation) of experimentally identified SiC mixed clusters at finite temperature.

Funder

Council of Scientific and Industrial Research, India

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry,Catalysis

Link

http://pubs.rsc.org/en/content/articlepdf/2021/NJ/D0NJ04515B

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