Siliconized silsesquioxane-based nonstick molds for ultrahigh-resolution lithography-Reference-Cited by-同舟云学术

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Siliconized silsesquioxane-based nonstick molds for ultrahigh-resolution lithography

Published:2012 Issue:33 Volume:22 Page:16754
ISSN:0959-9428
Container-title:Journal of Materials Chemistry
language:en
Short-container-title:J. Mater. Chem.

Author:

Lee Bong Kuk,Park Kun-Sik,Kim Dong-Pyo,Ryu Jin-Hwa,Park Jaehoon,Jeong Ye-Sul,Baek Kyu-Ha,Do Lee-Mi

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2012/JM/C2JM32386A

Reference43 articles.

1. Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication

2. Nanoimprint Lithography for Hybrid Plastic Electronics

3. Fabrication of photonic nanostructures in nonlinear optical polymers

4. Room-Temperature Nanoimprint Lithography of Non-thermoplastic Organic Films

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1. Highly Stable Organic Transistors on Paper Enabled by a Simple and Universal Surface Planarization Method;Advanced Materials Interfaces;2019-02-06

2. PHOTOCHEMICALLY CATALYSED POLYMERISATION OF 3-TRIMETHOXYSILYLPROPYL METHACRYLATE CONTAINING SILVER, COPPER AND ZINC IONS;Ceramics - Silikaty;2018-08-27

3. Surface energy-tunable iso decyl acrylate based molds for low pressure-nanoimprint lithography;Nanotechnology;2017-09-12

4. Flexible Nonstick Replica Mold for Transfer Printing of Ag Ink;Journal of Nanoscience and Nanotechnology;2016-03-01

5. Fabrication of a Large-Area Hierarchical Structure Array by Combining Replica Molding and Atmospheric Pressure Plasma Etching;Advanced Materials Interfaces;2015-06-18

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