Atomic layer deposition of metal fluorides through oxide chemistry
Author:
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2011/JM/C1JM11825K
Reference23 articles.
1. Metal Fluoride Thin Films Prepared by Atomic Layer Deposition
2. Improvements on Interface Reliability and Capacitance Dispersion of Fluorinated ALD-Al[sub 2]O[sub 3] Gate Dielectrics by CF[sub 4] Plasma Treatment
3. Atomic layer deposition and characterization of biocompatible hydroxyapatite thin films
4. Controlled Growth of Yttrium Oxysulphide Thin Films by Atomic Layer Deposition
5. In2S3 Atomic Layer Deposition and Its Application as a Sensitizer on TiO2 Nanotube Arrays for Solar Energy Conversion
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