Optical, chemical and coverage properties of magnesium fluoride formed by atomic layer deposition
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Publisher
Springer Science and Business Media LLC
Link
https://link.springer.com/content/pdf/10.1007/s10043-024-00867-7.pdf
Reference15 articles.
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2. Larruquert, J.I., Keski-Kuha, R.A.M.: Far ultraviolet optical properties of MgF2 films deposited by ion-beam sputtering and their application as protective coatings for Al. Opt. Commun. 215, 93–96 (2003)
3. Kennemore, C.M., Gibson, U.J.: Ion beam processing for coating MgF2 onto ambient temperature substrates. Appl. Opt. 23, 3608–3611 (1984)
4. Wilbrandt, S., Stenzel, O., Bischoff, M., Kaiser, N.: Combined in situ and ex situ optical data analysis of magnesium fluoride coatings deposited by plasma ion assisted deposition. Appl. Opt. 50, C5–C10 (2011)
5. Fragalà, M.E., Toro, R.G., Privitera, S., Malandrino, G.: MOCVD fabrication of magnesium fluoride films: effects of deposition parameters on structure and morphology. Chem. Vapor Deposit. 17, 80–87 (2011)
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