Laser-induced chemical vapour deposition of Si/C/H materials from monoorganylsilanes
Author:
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/1996/JM/JM9960600155
Reference46 articles.
1. Formation of fine silicon carbide powders by a vapor phase method
2. Synthesis of Boron Nitride from Triammoniadecaborane and Ammonia
3. Production of Fine Ceramic Powders from Chloromethylsilanes Using Pulsed Excimer Radiation
4. The Low-Temperature Metal-Organic Chemical Vapor Deposition (Ltmocvd) Route to Amorphous Silicon Semiconductors
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2. Structural and spectroscopic trends in the ground states of the monohalosilylenes: Emission spectroscopy of jet-cooled HSiI and DSiI;The Journal of Chemical Physics;2003
3. UV laser photolysis of silacyclopent-3-ene: effect of admixtures on nature of chemically vapour-deposited organosilicon films;Applied Organometallic Chemistry;2002-08-21
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5. IR laser-induced thermolysis of (chloromethyl)silane: complex reaction involving H2Si:, H2C: and HClSi: transients and yielding nanostructured Si/C/H phases;Journal of Materials Chemistry;2002-03-22
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