ArF Laser-Induced Chemical Vapor Deposition of Polythiene Films from Carbon Disulfide-Reference-Cited by-同舟云学术

ArF Laser-Induced Chemical Vapor Deposition of Polythiene Films from Carbon Disulfide

Published:2003-08-19 Issue:36 Volume:107 Page:9793-9801
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Tomovska Radmila¹,Bastl Zdeněk¹,Vorlíček Vladimír¹,Vacek Karel¹,Šubrt Jan¹,Plzák Zbyněk¹,Pola Josef¹

Affiliation:

1. Laser Chemistry Group, Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, 16502 Prague, Czech Republic, J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, 18223 Prague, Czech Republic, Institute of Physics, Academy of Sciences of the Czech Republic, 18040 Prague, Czech Republic, and Institute of Inorganic Chemistry, Academy of Sciences of the Czech Republic, 25068 Řež near Prague, Czech Republic

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp034411o

Reference77 articles.

1. Electronic spectoscopy of isoelectronic molecules. II. Linear triatomic groupings containing sixteen valence electrons

2. THE PHOTOLYSIS OF CARBON DISULFIDE AND CARBON DISULFIDE – OXYGEN MIXTURES

3. Laser induced aerosol formation in CS2 vapour

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