Ultra-clean high-mobility graphene on technologically relevant substrates-Reference-Cited by-同舟云学术

Ultra-clean high-mobility graphene on technologically relevant substrates

Published:2022 Issue:6 Volume:14 Page:2167-2176
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Tyagi Ayush¹²^ORCID,Mišeikis Vaidotas²³^ORCID,Martini Leonardo²^ORCID,Forti Stiven²^ORCID,Mishra Neeraj²³,Gebeyehu Zewdu M.²³^ORCID,Giambra Marco A.⁴,Zribi Jihene⁵,Frégnaux Mathieu⁵^ORCID,Aureau Damien⁵^ORCID,Romagnoli Marco⁶,Beltram Fabio¹^ORCID,Coletti Camilla²³^ORCID

Affiliation:

1. NEST, Scuola Normale Superiore, Piazza San Silvestro 12, 56127 Pisa, Italy

2. Center for Nanotechnology Innovation @NEST, Istituto Italiano di Technologia, Piazza San Silvestro 12, 56127 Pisa, Italy

3. Graphene Labs, Istituto Italiano di Tecnologia, via Morego 30, 16163 Genova, Italy

4. CamGraPhIC srl, 56124 Pisa, Italy

5. Institut Lavoisier de Versailles UMR 8180 Université Paris-Saclay, UVSQ, CNRS, 78035 Versailles, France

6. Photonic Networks and Technologies Lab, CNIT, 56124 Pisa, Italy

Abstract

2-step chemical cleaning allows enhanced removal of polymeric residues from the surface of graphene, leading to significantly improved electrical and morphological properties.

Funder

Graphene Flagship

Centre National de la Recherche Scientifique

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2022/NR/D1NR05904A

Reference59 articles.

1. A decade of graphene research: production, applications and outlook

2. A roadmap for graphene