Chlorine-mediated atomic layer deposition of HfO2 on graphene

Author:

Wilson Peter M.1,Chin Matt L.1,Ekuma Chinedu E.23ORCID,Najmaei Sina1,Price Katherine M.1,Schiros Theanne45,Dubey Madan1,Hone James6

Affiliation:

1. Sensors and Electron Devices Directorate, United States Army Research Laboratory, Adelphi, MD, USA

2. Department of Physics, Lehigh University, Bethlehem, PA 18015, USA

3. Institute for Functional Materials and Devices, Lehigh University, Bethlehem, PA 18015, USA

4. Materials Science and Engineering Center, Columbia University, New York, NY 10023, USA

5. Department of Science and Mathematics, Fashion Institute of Technology, New York, NY 10001, USA

6. Department of Mechanical Engineering, Columbia University, New York, New York 10027, USA

Abstract

The ALD process of deposition of ultrathin high-κ HfO2 on chlorinate graphene.

Funder

National Science Foundation

Army Research Laboratory

Lehigh University

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

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