Direct synthesis of graphene on silicon oxide by low temperature plasma enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

Direct synthesis of graphene on silicon oxide by low temperature plasma enhanced chemical vapor deposition

Published:2018 Issue:26 Volume:10 Page:12779-12787
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Muñoz Roberto¹²³⁴⁵^ORCID,Martínez Lidia¹²³⁴⁵^ORCID,López-Elvira Elena¹²³⁴⁵^ORCID,Munuera Carmen¹²³⁴⁵^ORCID,Huttel Yves¹²³⁴⁵^ORCID,García-Hernández Mar¹²³⁴⁵^ORCID

Affiliation:

1. Materials Science Factory

2. Instituto de Ciencia de Materiales de Madrid

3. (ICMM) Consejo Superior de Investigaciones Científicas (CSIC)

4. Madrid

5. Spain

Abstract

Direct, low temperature, catalyst-free and transfer-free growth of monolayer graphene films on silicon wafer with a native oxide.

Funder

H2020 European Research Council

Ministerio de Economía y Competitividad

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2018/NR/C8NR03210F

Reference60 articles.

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