Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics-Reference-Cited by-同舟云学术

Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics

Published:2015 Issue:33 Volume:3 Page:17332-17343
ISSN:2050-7488
Container-title:Journal of Materials Chemistry A
language:en
Short-container-title:J. Mater. Chem. A

Author:

Kim Hyungchul¹²³⁴,Ou Kai-Lin⁵⁶⁷⁴,Wu Xin⁵⁶⁷⁴,Ndione Paul F.⁸⁹⁴,Berry Joseph⁸⁹⁴,Lambert Yannick¹⁰¹¹¹²¹³,Mélin Thierry¹⁰¹¹¹²¹³,Armstrong Neal R.⁵⁶⁷⁴,Graham Samuel¹²³⁴¹⁴

Affiliation:

1. School of Mechanical Engineering

2. Georgia Institute of Technology

3. Atlanta

4. USA

5. Department of Chemistry & Biochemistry

6. University of Arizona

7. Tucson

8. National Renewable Energy Laboratory (NREL)

9. Golden

10. Institut d'Electronique, de Microélectronique et de Nanotechnologie (IEMN)

11. Le Centre National de la Recherche Scientifique (CNRS)

12. Villeneuve d'Ascq

13. France

14. School of Materials Science and Engineering

Abstract

Ultra-thin (0.5–10 nm) plasma-enhanced atomic layer deposited titanium oxide (TiO_x) films deposited on indium-tin-oxide contacts, are investigated as hole-blocking interlayers using conventional electrochemistry, Si-diodes, and heterojunction (P3HT:PCBM) organic photovoltaics (OPVs).

Funder

Basic Energy Sciences

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/TA/C5TA04687D

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3. Thin-Film Organic Electronic Devices