Author:
Zmbov K.,Hastie J. W.,Margrave J. L.
Publisher
Royal Society of Chemistry (RSC)
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy,General Engineering
Cited by
28 articles.
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1. Atomic Layer Etching of Al2O3 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and Hydrogen Fluoride;ACS Nano;2015-01-29
2. Atomic Layer Etching of HfO2Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2and HF;ECS Journal of Solid State Science and Technology;2015
3. Purification of NaYF4-Based Upconversion Phosphors;Chemistry of Materials;2014-03-03
4. Stannylenes: Structures, Electron Affinities, Ionization Energies, and Singlet–Triplet Gaps of SnX2/SnXY and XSnR/SnR2/RSnR′ Species (X; Y = H, F, Cl, Br, I, and R; R′ = CH3, SiH3, GeH3, SnH3);Inorganic Chemistry;2012-01-03
5. Experimental and theoretical determination of the saturation vapor pressure of silicon in a wide range of temperatures;Russian Journal of Inorganic Chemistry;2010-12