Atomic Layer Etching of HfO2Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2and HF
Author:
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference59 articles.
1. Plasma atomic layer etching using conventional plasma equipment
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3. Realization of atomic layer etching of silicon
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5. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges
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