The influence of surface topography on the field emission of nanostructured copper oxide thin films grown by oblique incidence deposition-Reference-Cited by-同舟云学术

The influence of surface topography on the field emission of nanostructured copper oxide thin films grown by oblique incidence deposition

Published:2015 Issue:24 Volume:3 Page:6389-6394
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Chatterjee S.¹²³⁴²,Kumar M.¹²³,Pal A.⁵⁶³,Thakur I.⁴²³,Som T.¹²³

Affiliation:

1. Institute of Physics

2. Bhubaneswar

3. India

4. CSIR-Institute of Minerals and Materials Technology

5. Tata Institute of Fundamental Research

6. Colaba

Abstract

The surface morphology dependent field electron emission characteristic of copper oxide thin films shows superior field emission of obliquely sputter deposited thin film (turn-on field ∼1.3 V μm⁻¹) compared to normally deposited film.

Funder

Department of Science and Technology, Ministry of Science and Technology

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/TC/C5TC00662G

Reference39 articles.

1. Controlled clustering in metal nanorod arrays leads to strongly enhanced field emission characteristics

2. Field emission from hydrogen titanate nanotubes

3. A Carbon Nanotube Field-Emission Electron Source

4. Stable field emission from arrays of vertically aligned free-standing metallic nanowires

5. Field emission from zinc oxide nanopins

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