Controlled deposition of large-area and highly-ordered thin films: effect of dip-coating-induced morphological evolution on resistive memory performance-Reference-Cited by-同舟云学术

Controlled deposition of large-area and highly-ordered thin films: effect of dip-coating-induced morphological evolution on resistive memory performance

Published:2019 Issue:12 Volume:7 Page:3512-3521
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Li Yang¹²³⁴⁵^ORCID,Zhang Cheng⁶⁷⁸⁹⁵,Li Zhuang⁶⁷⁸⁹⁵,Gu Peiyang¹⁰¹¹¹²¹³,Wang Zilong¹⁰¹¹¹²¹³,Li Hua⁶⁷⁸⁹⁵,Lu Jianmei⁶⁷⁸⁹⁵^ORCID,Zhang Qichun¹⁰¹¹¹²¹³^ORCID

Affiliation:

1. Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application

2. School of Mathematics and Physics

3. Suzhou University of Science and Technology

4. Suzhou

5. P. R. China

6. College of Chemistry

7. Chemical Engineering and Materials Science

8. Soochow University

9. Suzhou 215123

10. School of Materials Science and Engineering

11. Nanyang Technological University

12. Singapore 639798

13. Singapore

Abstract

A scalable dip-coating technique is reported to precisely control nano-patterned films and resistive memory devices with a record reproducibility of 96%.

Funder

Ministry of Education - Singapore

State Key Laboratory of Supramolecular Structure and Materials

National Natural Science Foundation of China

Jilin University

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/TC/C9TC00431A

Reference61 articles.