Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al2O3

Author:

Wang Qian12345ORCID,Cheng Xinhong12345,Zheng Li12345,Shen Lingyan12345,Li Jingjie12345,Zhang Dongliang12345,Qian Ru12345,Yu Yuehui12345

Affiliation:

1. State Key Laboratory of Functional Materials for Informatics

2. Shanghai Institute of Microsystem and Information Technology

3. Chinese Academy of Sciences

4. Shanghai 200050

5. P. R. China

Abstract

In this paper, AlNO nano-films have been deposited on an AlGaN/GaN heterojunction by alternating growth of AlN and Al2O3 using plasma enhanced atomic layer deposition (PEALD).

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

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