Direct observation of contact resistivity for monolayer TMD based junctions via PL spectroscopy

Author:

Zhang Linglong1,Tang Yilin2,Yan Han3,Yildirim Tanju4,Yang Shunshun1ORCID,Song Haizeng5,Zhang Xiaowei6ORCID,Tian Fuguo1,Luo Zhongzhong7,Pei Jiajie8,Yang Qi9,Xu Yixin1,Song Xiaoying10,Khan Ahmed Raza211,Xia Sihao1,Sun Xueqian2,Wen Bo12ORCID,Zhou Fei1314,Li Weiwei1ORCID,Liu Youwen1,Zhang Han9ORCID

Affiliation:

1. College of Physics, Nanjing University of Aeronautics and Astronautics, Key Laboratory of Aerospace Information Materials and Physics (NUAA), MIIT, Nanjing 211106, China

2. Research School of Electrical, Energy and Materials Engineering, College of Engineering and Computer Science, The Australian National University, Canberra 2601, Australia

3. Department of Materials Science and Metallurgy, University of Cambridge, Cambridge CB3 0FS, UK

4. Center for Functional Sensor & Actuator (CFSN), National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044, Japan

5. School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China

6. Department of Electrical Engineering and Computer Science, Ningbo University, Ningbo 315211, China

7. College of Electronic and Optical Engineering & College of Flexible Electronics (Future Technology), Jiangsu Province Engineering Research Center for Fabrication and Application of Special Optical Fiber Materials and Devices, Nanjing University of Posts and Telecommunications, 9 Wenyuan Road, Nanjing, Jiangsu 210023, China

8. College of Materials Science and Engineering, Fuzhou University, Fuzhou 350108, Fujian, China

9. Collaborative Innovation Center for Optoelectronic Science and Technology, International Collaborative Laboratory of 2D Materials for Optoelectronic Science and Technology of Ministry of Education and Guangdong Province, Shenzhen University, Shenzhen, 518060, China

10. College of Optoelectronic Engineering, Chongqing University of Posts and Telecommunications, Chongqing, China

11. Department of Industrial and Manufacturing Engineering University of Engineering and Technology (Rachna College), Lahore 54700, Pakistan

12. Institute of Nanosurface Science and Engineering, Guangdong Provincial Key Laboratory of Micro/Nano Optomechatronics Engineering, Shenzhen University, Shenzhen 518060, China

13. National Key Laboratory for Precision Hot Processing of Metals; School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China

14. State Key Laboratory for Environment-friendly Energy Materials, School of Materials Science and Engineering, Southwest University of Science and Technology, Mianyang, 621010, China

Abstract

We report a simple, rapid and low-cost method to study the tunnel barrier dominated contact resistance of mTMD based junctions through PL spectroscopy.

Funder

China Postdoctoral Science Foundation

Excellent Youth Foundation of Jiangsu Scientific Committee

Chongqing Postdoctoral Science Foundation

Natural Science Foundation of Jiangsu Province

Natural Science Foundation of Zhejiang Province

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

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