Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates-Reference-Cited by-同舟云学术

Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates

Published:2016 Issue:11 Volume:12 Page:2914-2922
ISSN:1744-683X
Container-title:Soft Matter
language:en
Short-container-title:Soft Matter

Author:

Wan Lei¹²³⁴,Ji Shengxiang⁵⁶⁷⁸,Liu Chi-Chun⁹¹⁰,Craig Gordon S. W.¹¹¹²¹³,Nealey Paul F.¹¹¹²¹³

Affiliation:

1. HGST

2. a Western Digital Company

3. San Jose Research Center

4. San Jose, USA

5. Key Laboratory of Polymer Ecomaterials

6. Changchun Institute of Applied Chemistry

7. Chinese Academy of Science

8. Changchun, 130022 China

9. IBM Albany NanoTech

10. Albany, USA

11. Institute for Molecular Engineering

12. University of Chicago

13. Chicago, USA

Abstract

We demonstrate that annealing a thin film of block copolymer in the vapor of a solvent that is selective to one of the blocks can yield block copolymer domains that do not naturally occur in the bulk, and that these domains can be aligned with and registered to an underlying chemical pattern.

Publisher

Royal Society of Chemistry (RSC)

Subject

Condensed Matter Physics,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2016/SM/C5SM02829A

Reference63 articles.

1. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics

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3. Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

4. Block Copolymer Thermodynamics: Theory and Experiment

5. A Novel Approach to Addressable 4 Teradot/in.2Patterned Media

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