The radiation chemistry of focused electron-beam induced etching of copper in liquids-Reference-Cited by-同舟云学术

The radiation chemistry of focused electron-beam induced etching of copper in liquids

Published:2019 Issue:24 Volume:11 Page:11550-11561
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Lami Sarah K.¹²³⁴⁵^ORCID,Smith Gabriel¹²³⁴,Cao Eric¹²³⁴,Hastings J. Todd¹²³⁴^ORCID

Affiliation:

1. Department of Electrical and Computer Engineering

2. University of Kentucky

3. Lexington

4. USA

5. AL-Furat AL-Awsat Technical University

Abstract

Well-controlled, focused electron-beam induced etching of copper thin films has been successfully conducted on bulk substrates in an environmental scanning electron microscope by controlling liquid-film thickness with an in situ correlative interferometry system.

Funder

Ministry of Higher Education and Scientific Research

National Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2019/NR/C9NR01857C

Reference95 articles.

1. In situ Study of Oxidative Etching of Palladium Nanocrystals by Liquid Cell Electron Microscopy

2. Single-particle mapping of nonequilibrium nanocrystal transformations

3. Probing the oxidative etching induced dissolution of palladium nanocrystals in solution by liquid cell transmission electron microscopy

4. Electrochemical electron beam lithography: Write, read, and erase metallic nanocrystals on demand

5. Constant-rate dissolution of InAs nanowires in radiolytic water observed by in situ liquid cell TEM

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