Thioiminium and thiaphospholanium derived from acetonitrile via nickel(ii)–(2-mercaptophenyl)phosphine complexation
Author:
Affiliation:
1. Department of Chemistry
2. National Taiwan Normal University
3. Taipei 11677
4. Taiwan
5. Instrumentation Center
Abstract
The acid produced by nickel complexation drives incorporation of acetonitrile to yield uncommon thioiminium/phospholanium species.
Funder
Ministry of Science and Technology, Taiwan
Publisher
Royal Society of Chemistry (RSC)
Subject
Inorganic Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2015/DT/C5DT03316K
Reference19 articles.
1. T. C. Bhalla , N.Sharma and R. K.Bhatia, in Microorganisms in Environmental Management: Microbes and Environment, ed. T. Satyanarayana, B. N. Johri and A. Prakash, Springer, New York, 2012, ch. 25, pp. 569–587
2. Nitrilase
3. Nitrilase
4. Catalysis in the nitrilase superfamily
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Synthesis of New Iminium Derivatives of Sulphonio-сloso-Decaborate Anion (Bu4N)[2-B10H9SC(NH2)R] (R = –CH3, –CH2CH3, –CH(CH3)2, –Ph, –PhCH3);Russian Journal of Inorganic Chemistry;2023-12
2. Synthesis of New Iminium Derivatives of Sulphonio-сloso-Decaborate Anion (Bu4N)[2-B10H9SC(NH2)R] (R = –CH3, –CH2CH3, –CH(CH3)2, –Ph, –PhCH3);Журнал неорганической химии;2023-12-01
3. Photoinduced NO and HNO Production from Mononuclear {FeNO}6 Complex Bearing a Pendant Thiol;Journal of the American Chemical Society;2020-04-11
4. Nickel(iii)-mediated oxidative cascades from a thiol-bearing nickel(ii) precursor to the nickel(iv) product;Dalton Transactions;2018
5. Re(CO)3-Templated Synthesis of α-Amidinoazadi(benzopyrro)methenes;Inorganic Chemistry;2017-11-27
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3