Effect of molecular weight on the EUV-printability of main chain scission type polymers
Author:
Affiliation:
1. IMEC
2. 3001 Leuven
3. Belgium
4. KU Leuven Department of Chemistry
5. Centre for Nanoscience and Nanotechnology
6. Panjab University
7. 160014 Chandigarh
8. India
Abstract
This study on the main chain scission type polymers, PMMA and a copolymer system, shows that the EUV-printability is proportional to the Mw of the starting material, which is attributed to the enhanced litho-parameters of higher Mw material.
Funder
H2020 Marie Skłodowska-Curie Actions
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2020/TC/C9TC06482F
Reference36 articles.
1. Samsung Press Release, Samsung Electronics Starts Production of EUV-based 7nm LPP Process, Korea, 18/10/2018; Available at https://news.samsung.com/global/samsung-electronics-starts-production-of-euv-based-7nm-lpp-process
2. Radiation Chemistry in Chemically Amplified Resists
3. Reactivity between Biphenyl and Precursor of Solvated Electrons in Tetrahydrofuran Measured by Picosecond Pulse Radiolysis in Near-Ultraviolet, Visible, and Infrared
4. Secondary Electrons in EUV Lithography
5. A. Robinson and R.Lawson , Materials and Processes for Next Generation Lithography , Elsevier , 2011 , vol. 11
Cited by 23 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Fast and Selective Main-Chain Scission of Vinyl Polymers Using the Domino Reaction in the Alternating Sequence for Transesterification;ACS Macro Letters;2024-07-26
2. Study of electron-induced chemical transformations in polymers;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-07-16
3. Advanced lithography materials: From fundamentals to applications;Advances in Colloid and Interface Science;2024-07
4. Impact of vacuum ultraviolet photons on ultrathin polymethylmethacrylate during plasma etching;Journal of Vacuum Science & Technology A;2024-04-10
5. Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist─Utilizing Radical- and Acid-Amplified Cross-Linking;Chemistry of Materials;2024-02-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3