Novel chemically amplified resists incorporating anionic photoacid generator functional groups for sub-50-nm half-pitch lithography-Reference-Cited by-同舟云学术

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Novel chemically amplified resists incorporating anionic photoacid generator functional groups for sub-50-nm half-pitch lithography

Published:2009 Issue:18 Volume:19 Page:2797
ISSN:0959-9428
Container-title:Journal of Materials Chemistry
language:en
Short-container-title:J. Mater. Chem.

Author:

Gonsalves Kenneth E.,Wang Mingxing,Lee Cheng-Tsung,Yueh Wang,Tapia-Tapia Melina,Batina Nikola,Henderson Clifford L.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2009/JM/B818612J

Reference29 articles.

1. Extreme ultraviolet lithography: A review

2. Extreme ultraviolet lithography

3. The photogeneration of acid and base within polymer coatings: Approaches to polymer curing and imaging

4. Photoacid and Photobase Generators: Prospects and Their Use in the Development of Polymeric Photosensitive Systems

5. Distribution of onium salt photoinitiators in a two-phase epoxy system

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