Deposition of yttria-stabilized zirconia thin films by atomic layer epitaxy from β-diketonate and organometallic precursors-Reference-Cited by-同舟云学术

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Deposition of yttria-stabilized zirconia thin films by atomic layer epitaxy from β-diketonate and organometallic precursors

Published:2002-01-23 Issue:3 Volume:12 Page:442-448
ISSN:0959-9428
Container-title:Journal of Materials Chemistry
language:
Short-container-title:J. Mater. Chem.

Author:

Putkonen Matti,Sajavaara Timo,Niinistö Jaakko,Johansson Leena-Sisko,Niinistö Lauri

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2002/JM/B107799F

Cited by 55 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition;Surfaces and Interfaces;2024-03

2. Optimizing energy storage performance of ALD YSZ thin film devices via yttrium concentration variations;Journal of Energy Storage;2023-12

3. Thermal conductivity of yttria‐stabilized zirconia thin films grown by plasma‐enhanced atomic layer deposition;Journal of the American Ceramic Society;2023-05-15

4. High ionic conductivity of ultralow yttria concentration yttria-stabilized zirconia thin films;Journal of Vacuum Science & Technology A;2022-07

5. Current Applications and Future Potential of Rare Earth Oxides in Sustainable Nuclear, Radiation, and Energy Devices: A Review;ACS Applied Electronic Materials;2022-06-23

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