Optimization of thermal field of 150 mm SiC crystal growth by PVT method
Author:
Affiliation:
1. Harbin Institute of Technology, School of Chemistry and Chemical Engineering, Heilongjiang 150001, China
2. Soft-Impact China (Harbin), Ltd, Heilongjiang 150028, China
3. Harbin KY Semiconductor, Inc, Heilongjiang 150028, China
Abstract
Funder
Natural Science Foundation of Heilongjiang Province
National Key Research and Development Program of China
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2022/RA/D2RA02875A
Reference21 articles.
1. R.Kirschman , Status of Silicon Carbide (SiC) as a WideBandgap Semiconductor for High Temperature Applications: A Review , Wiley-IEEE Press , 2009
2. Status of silicon carbide (SiC) as a wide-bandgap semiconductor for high-temperature applications: A review
3. Enlargement Growth of Large 4H-SiC Bulk Single Crystal
4. High Quality 150 mm 4H SiC Wafers for Power Device Production
5. A review of the structure of silicon carbide
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