Breaking the symmetry of nanosphere lithography with anisotropic plasma etching induced by temperature gradients-Reference-Cited by-同舟云学术

Breaking the symmetry of nanosphere lithography with anisotropic plasma etching induced by temperature gradients

Published:2021 Issue:2 Volume:3 Page:359-369
ISSN:2516-0230
Container-title:Nanoscale Advances
language:en
Short-container-title:Nanoscale Adv.

Author:

Darvill Daniel¹²³^ORCID,Iarossi Marzia¹²³⁴⁵,Abraham Ekeroth Ricardo M.¹²³⁶⁷,Hubarevich Aliaksandr¹²³,Huang Jian-An¹²³^ORCID,De Angelis Francesco¹²³^ORCID

Affiliation:

1. Istituto Italiano di Tecnologia

2. 16136 Genova

3. Italy

4. Dipartimento di Informatica, Bioingegneria, Robotica e Ingegneria dei Sistemi (DIBRIS)

5. Università; degli Studi di Genova

6. Instituto de Física Arroyo Seco (CIFICEN-CICPBA-CONICET)

7. Universidad Nacional del Centro de la Provincia de Buenos Aires

Abstract

A strongly anisotropic etching process mediated by temperature is presented to create nano mushroom arrays from a monolayer of spheres.

Funder

Istituto Italiano di Tecnologia

Publisher

Royal Society of Chemistry (RSC)

Subject

General Engineering,General Materials Science,General Chemistry,Atomic and Molecular Physics, and Optics,Bioengineering

Link

http://pubs.rsc.org/en/content/articlepdf/2021/NA/D0NA00718H

Reference96 articles.

1. Self-Assembly of Colloidal Spheres toward Fabrication of Hierarchical and Periodic Nanostructures for Technological Applications

2. Advanced Colloidal Lithography Beyond Surface Patterning

3. Nanosphere Lithography: A Powerful Method for the Controlled Manufacturing of Nanomaterials

4. Polymers in conventional and alternative lithography for the fabrication of nanostructures

5. Two-Dimensional Interfacial Colloidal Crystals

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