Nanoindentation and deformation behaviors of silicon covered with amorphous SiO2: a molecular dynamic study-Reference-Cited by-同舟云学术

Nanoindentation and deformation behaviors of silicon covered with amorphous SiO2: a molecular dynamic study

Author:

Chen Juan¹²³⁴^ORCID,Shi Junqin¹²³⁴^ORCID,Wang Yunpeng¹²³⁴,Sun Jiapeng⁵⁶⁷⁴,Han Jing⁸⁹¹⁰⁴,Sun Kun¹²³⁴,Fang Liang¹²³⁴¹¹^ORCID

Affiliation:

1. State Key Laboratory for Mechanical Behavior of Materials

2. Xi'an Jiaotong University

3. Xi'an 710049

4. China

5. College of Mechanics and Materials

6. Hohai University

7. Nanjing 210098

8. School of Mechanical and Electrical Engineering

9. China University of Mining and Technology

10. Xuzhou 221116

11. School of Mechanical & Electrical Engineering

Abstract

Force–indentation depth curves and cross-section snapshots of phase transformation evolution of silicon under various film thickness (H).

Funder

National Natural Science Foundation of China

Natural Science Foundation of Shaanxi Province

Natural Science Foundation of Jiangsu Province

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

Reference51 articles.

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