Influence of deposition temperature on microstructure and gas-barrier properties of Al<sub>2</sub>O<sub>3</sub> prepared by plasma-enhanced atomic layer deposition on a polycarbonate substrate-Reference-Cited by-同舟云学术

Influence of deposition temperature on microstructure and gas-barrier properties of Al₂O₃ prepared by plasma-enhanced atomic layer deposition on a polycarbonate substrate

Published:2023 Issue:6 Volume:13 Page:3766-3772
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Ren Yueqing¹^ORCID,Sun Xiaojie¹,Chen Lanlan¹,Wei Hui¹,Feng Bo¹,Chen Jingyun¹

Affiliation:

1. National Institute of Clean-and-Low-Carbon Energy, Beijing 102211, China

Abstract

Temperature dependence of the structural evolution of plasma-enhanced atomic layer deposited Al2O3 film and the PC substrate.

Funder

National Key Research and Development Program of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2023/RA/D3RA00121K

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1. Comparative Study of Plasma-Enhanced-Atomic-Layer-Deposited Al₂O₃/HfO₂/SiO₂ and HfO₂/Al₂O₃/SiO₂ Trilayers for Ultraviolet Laser Applications;ACS Applied Materials & Interfaces;2024-06-05