Anti-reflection layers fabricated by a one-step copper-assisted chemical etching with inverted pyramidal structures intermediate between texturing and nanopore-type black silicon-Reference-Cited by-同舟云学术

Anti-reflection layers fabricated by a one-step copper-assisted chemical etching with inverted pyramidal structures intermediate between texturing and nanopore-type black silicon

Published:2014-06-25 Issue:30 Volume:2 Page:12043
ISSN:2050-7488
Container-title:Journal of Materials Chemistry A
language:en
Short-container-title:J. Mater. Chem. A

Author:

Lu Yen-Tien,Barron Andrew R.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2014/TA/C4TA02006E

Reference25 articles.

1. Light trapping properties of pyramidally textured surfaces

2. Optimization of KOH etching process to obtain textured substrates suitable for heterojunction solar cells fabricated by HWCVD

3. Optical thin-film materials with low refractive index for broadband elimination of Fresnel reflection

4. Microstructured surface design for omnidirectional antireflection coatings on solar cells

5. Realization of a near-perfect antireflection coating for silicon solar energy utilization

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