Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond-Reference-Cited by-同舟云学术

Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond

Published:2015 Issue:9 Volume:7 Page:4031-4037
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Mojarad N.¹²³,Hojeij M.¹²³,Wang L.¹²³,Gobrecht J.¹²³,Ekinci Y.¹²³

Affiliation:

1. Laboratory for Micro- and Nanotechnology

2. Paul Scherrer Institute

3. 5232 Villigen, Switzerland

Abstract

Using extreme ultraviolet interference lithography, we demonstrate patterning of different inorganic photoresists, reaching the highest reported photolithography resolution of 7 nm half-pitch.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2015/NR/C4NR07420C

Reference43 articles.

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3. The Future of Lithography: SEMATECH Litho Forum 2008

4. D. T. Attwood , Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications, Cambridge University Press, 2000

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