Reducing the effects of shot noise using nanoparticles-Reference-Cited by-同舟云学术

Reducing the effects of shot noise using nanoparticles

Published:2015 Issue:5 Volume:3 Page:955-959
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Morakinyo Moshood K.¹²³⁴,Rananavare Shankar B.⁵⁶⁷⁴

Affiliation:

1. Portland Technology Development

2. Intel Corporation Ronler Acres

3. Hillsboro

4. USA

5. Chemistry Department

6. Portland State University

7. Portland

Abstract

We report a new method to remove the effects of fluctuations in the pattern dimensions caused by statistical variations in the impinging photons/particles at the nanoscale. By using precisely size-controlled nanoparticles as a template in conjunction with resist reflow, the method is capable of reducing the transistor source, drain contact hole dimensions to <20 nm, while remaining compatible with currently available fabrication methods.

Funder

Intel Corporation

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/TC/C4TC01339E

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