Controlled self-assembly of block copolymers in printed sub-20 nm cross-bar structures-Reference-Cited by-同舟云学术

Controlled self-assembly of block copolymers in printed sub-20 nm cross-bar structures

Published:2021 Issue:17 Volume:3 Page:5083-5089
ISSN:2516-0230
Container-title:Nanoscale Advances
language:en
Short-container-title:Nanoscale Adv.

Author:

Park Tae Wan¹²^ORCID,Kang Young Lim³,Byun Myunghwan⁴,Hong Suck Won⁵,Ahn Yong-Sik³,Lee Junghoon⁶,Park Woon Ik³^ORCID

Affiliation:

1. Electronic Convergence Materials Division, Korea Institute of Ceramic Engineering & Technology (KICET), 101 Soho-ro, Jinju 52851, Republic of Korea

2. Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea

3. Department of Materials Science and Engineering, Pukyoung National University (PKNU), 45 Yongso-ro, Nam-gu, Busan 48513, Republic of Korea

4. Department of Advanced Materials Engineering, Keimyung University, 1095 Dalgubeol-daero, Daegu 42601, Republic of Korea

5. Department of Cogno-Mechatronics Engineering, Department of Optics and Mechatronics Engineering, College of Nanoscience and Nanotechnology, Pusan National University, Busan 46241, Republic of Korea

6. Department of Metallurgical Engineering, Pukyoung National University (PKNU), 45 Yongso-ro, Nam-gu, Busan 48513, Republic of Korea

Abstract

Combined nanopatterning method consisting of nanotransfer printing process and directed self-assembly of block copolymers to generate complex and unusual oxide/metal hybrid pattern geometries.

Funder

National Research Foundation of Korea

Publisher

Royal Society of Chemistry (RSC)

Subject

General Engineering,General Materials Science,General Chemistry,Atomic and Molecular Physics, and Optics,Bioengineering

Link

http://pubs.rsc.org/en/content/articlepdf/2021/NA/D1NA00357G

Reference41 articles.

1. Rapid Assembly of Nanolines with Precisely Controlled Spacing from Binary Blends of Block Copolymers

2. Density Doubling of Block Copolymer Templated Features

3. A Path to Ultranarrow Patterns Using Self-Assembled Lithography

4. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

5. Hierarchical multi-level block copolymer patterns by multiple self-assembly

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1. Illuminating Recent Progress in Nanotransfer Printing: Core Principles, Emerging Applications, and Future Perspectives;Advanced Science;2023-11-30

2. Direct Printing of Ultrathin Block Copolymer Film with Nano‐in‐Micro Pattern Structures;Advanced Science;2023-08-21

3. High-Resolution Nanotransfer Printing of Porous Crossbar Array Using Patterned Metal Molds by Extreme-Pressure Imprint Lithography;Nanomaterials;2023-08-14

4. Formation of Multiscale Pattern Structures by Combined Patterning of Nanotransfer Printing and Laser Micromachining;Nanomaterials;2023-08-13