Hierarchical multi-level block copolymer patterns by multiple self-assembly-Reference-Cited by-同舟云学术

Hierarchical multi-level block copolymer patterns by multiple self-assembly

Published:2019 Issue:17 Volume:11 Page:8433-8441
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Jung Hyunsung¹²³⁴,Shin Won Ho¹²³⁴^ORCID,Park Tae Wan¹²³⁴,Choi Young Joong¹²³⁴,Yoon Young Joon¹²³⁴,Park Sung Heum⁵⁶⁷⁴⁸^ORCID,Lim Jae-Hong⁹¹⁰¹¹⁴^ORCID,Kwon Jung-Dae⁹¹⁰¹¹⁴,Lee Jung Woo¹²¹³¹⁴⁴^ORCID,Kwon Se-Hun¹²¹³¹⁴⁴,Seong Gi Hun¹⁵¹⁶¹⁷⁴,Kim Kwang Ho¹²¹³¹⁴⁴⁸^ORCID,Park Woon Ik¹²³⁴⁸^ORCID

Affiliation:

1. Electronic Convergence Materials Division

2. Korea Institute of Ceramic Engineering & Technology (KICET) 101 Soho-ro

3. Jinju 52851

4. Republic of Korea

5. Department of Physics

6. Pukyoung National University (PKNU)

7. Busan 48547

8. Global Frontier R&D Center for Hybrid Interface Materials

9. Surface Technology Division

10. Korea Institute of Materials Science (KIMS)

11. Gyeongnam 51395

12. Department of Materials Science and Engineering

13. Pusan National University (PNU)

14. Pusan 46241

15. Department of Bionano Engineering

16. Hanyang University

17. Ansan 15588

Abstract

Unusual pattern generation of various 2D and 3D nanostructures can be achieved by the multiple self-assembly of block copolymers (BCPs) such as big-dot, double-dot, line-on-dot, pondering, dot-in-honeycomb, dot-in-pondering, and line-on-pondering patterns.

Funder

National Research Foundation of Korea

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2019/NR/C9NR00774A

Reference41 articles.

1. Graphoepitaxy of Spherical Domain Block Copolymer Films

2. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates

3. Nanostructure engineering by templated self-assembly of block copolymers