Spatial atmospheric pressure molecular layer deposition of alucone films using dimethylaluminum isopropoxide as the precursor-Reference-Cited by-同舟云学术

Spatial atmospheric pressure molecular layer deposition of alucone films using dimethylaluminum isopropoxide as the precursor

Published:2022 Issue:20 Volume:51 Page:7918-7927
ISSN:1477-9226
Container-title:Dalton Transactions
language:en
Short-container-title:Dalton Trans.

Author:

Jain Hardik¹²^ORCID,Creatore Mariadriana²^ORCID,Poodt Paul¹²

Affiliation:

1. TNO/Holst Centre, 5656 AE Eindhoven, Netherlands

2. Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands

Abstract

Dimethylaluminum isopropoxide (DMAI) and ethylene glycol (EG) yield alucone films with properties similar to those of films prepared using trimethylaluminum (TMA) and EG but with much higher deposition rates (nm s−1).

Funder

H2020 Marie Skłodowska-Curie Actions

Publisher

Royal Society of Chemistry (RSC)

Subject

Inorganic Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2022/DT/D2DT00570K

Reference47 articles.

1. Layer-by-layer polycondensation of nylon 66 by alternating vapour deposition polymerization

2. Atomic layer deposition of polyimide thin films

3. Organic and inorganic–organic thin film structures by molecular layer deposition: A review

4. Molecular Layer Deposition of Alucone Polymer Films Using Trimethylaluminum and Ethylene Glycol

5. “Zincone” Zinc Oxide−Organic Hybrid Polymer Thin Films Formed by Molecular Layer Deposition

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