Chemical vapor deposition of titanium nitride thin films: kinetics and experiments-Reference-Cited by-同舟云学术

Chemical vapor deposition of titanium nitride thin films: kinetics and experiments

Published:2019 Issue:26 Volume:21 Page:3974-3981
ISSN:1466-8033
Container-title:CrystEngComm
language:en
Short-container-title:CrystEngComm

Author:

Su Juan¹²³⁴⁵,Boichot Raphaël¹²³⁴⁵,Blanquet Elisabeth¹²³⁴⁵,Mercier Frédéric¹²³⁴⁵^ORCID,Pons Michel¹²³⁴⁵

Affiliation:

1. Université Grenoble Alpes

2. CNRS

3. Grenoble INP

4. SIMaP

5. F-38000 Grenoble

Abstract

Titanium nitride (TiN) films were grown by chemical vapor deposition (CVD) from titanium chlorides, ammonia (NH₃) and hydrogen (H₂) on single crystal c-plane sapphire, WC–Co, stainless steel and amorphous graphite substrates. The preferred orientation and color of TiN layer are studied by combining a simplified kinetic model with experiments.

Publisher

Royal Society of Chemistry (RSC)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/CE/C9CE00488B

Reference38 articles.

1. Transmission electron microscopy studies of growth and interface structure of chemically vapour deposited TiC and TiN films on WCCo alloy subsrates

2. State of the art in hard coatings for carbide cutting tools

3. Corrosion resistance appraisal of TiN, TiCN and TiAlN coatings deposited by CAE-PVD method on WC–Co cutting tools exposed to artificial sea water

4. Review of CVD TiN coatings for wear-resistant applications: deposition processes, properties and performance

5. The effect of deposition temperature on microstructure and properties of thermal CVD TiN coatings

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